what's new

October 8, 2012

International Workshop on EUV and Soft X-Ray Sources, October 8-11, Dublin, Ireland

June 25, 2012

The state organization NRW.INVEST honors each year the best investments of foreign companies in North Rhine-Westphalia. This year XTREME technologies received the award in the “Innovation” category. Find a video (lowres/hires) here.
"It is a honor for us to receive the NRW.INVEST AWARD in the Innovation category. It is thanks to our close collaboration with the Fraunhofer Institute and other research facilities here that we are in a position to manufacture such innovative products."
(Dr. Marc Corthout)

July 11, 2011

IMEC announces  printing of the first Extreme Ultra Violet (EUV)-light wafers with ASML NXE:3100 mounted with XTREME’s laser-assisted discharge plasma (LDP) source. For details, visit Imec News.

February 28, 2011

IMEC installs  ASML’s pre-production EUV scanner NXE:3100 mounted with XTREME’s laser-assisted discharge plasma (LDP) source. For details, visit Imec News.

XTREME technologies GmbH develops, manufactures, markets and services EUV (Extreme Ultra-Violet) light sources for the semiconductor lithography market.

Together with our parent company USHIO INC., Tokyo, Japan, our goal is to extend Moore's Law by delivering powerful and reliable EUV light sources at 13.5 nm wavelength and thus paving the way for the semiconductor manufacturing of the coming decades.

XTREME's innovative solution - Laser-assisted Discharge Plasma (LDP) - combines the advantages of the traditional laser based and traditional discharge based technologies to generate EUV photons.