October 18, 2012

Announcement of Extreme Ultraviolet (EUV) Business from USHIO INC.:
At “2012 International Symposium on Extreme Ultraviolet Lithography” held in Brussels, Belgium from October 1 to October 4, 2012, Ushio made an announcement of stable operation of the EUV light source for the past half year at IMEC (Belgium), an international research institution, experimental results of high output power up to 74W, and verification of feasibility of 250W.
Based on such accomplishments, USHIO will continue promoting the business to achieve mass production of DPP (Discharge Produced Plasma) EUV light source.

June 25, 2012

The state organization NRW.INVEST honors each year the best investments of foreign companies in North Rhine-Westphalia. This year XTREME technologies received the award in the “Innovation” category. Find a video (lowres/hires) here.
"It is a honor for us to receive the NRW.INVEST AWARD in the Innovation category. It is thanks to our close collaboration with the Fraunhofer Institute and other research facilities here that we are in a position to manufacture such innovative products."
(Dr. Marc Corthout)

July 11, 2011

IMEC announces  printing of the first Extreme Ultra Violet (EUV)-light wafers with ASML NXE:3100 mounted with XTREME’s laser-assisted discharge plasma (LDP) source. For details, visit Imec News.

February 28, 2011

IMEC installs  ASML’s pre-production EUV scanner NXE:3100 mounted with XTREME’s laser-assisted discharge plasma (LDP) source. For details, visit Imec News.